FB-2200

The FB-2200 allows for rapid and precise specimen preparation for both transmission and scanning electron microscopy of semiconductors and other advanced materials.
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• High precision and high milling rates
  • The use of a new low aberration ion optical system allows a maximum beam current of 60 nA at an accelerating voltage of 40 kV.
• A micro-sampling system is available as an option
  • Site-specific micro-sampling preparation from bulk samples is achieved in a completely dry vacuum environment allowing preparation of samples free from foreign particles, oxidation, charging, and other problems.
  • A newly developed isolation sample holder allows the encapsulation of a milled specimen into a protective atmosphere for contamination free transfer into an external analysis SEM / TEM
• Minimizing specimen damage
  • Compatible specimen holders for FB-2200 and Hitachi TEMs/SEMs are provided for specimen preparation with high precision and reliability. This arrangement allows milling and microscopy without specimen repositioning, thereby minimizing specimen damage during repeated preparation and microscopy.
• A wide range of beam energies
  • Operators can choose the optimum operating voltage (or beam energy) for milling and microscopy to best suit the specimen. Low beam energies of 2kV and 5kV for specimen fine polishing are available as option.
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Nothing is worse than loosing a nicely prepared TEM sample by some accident during a manual transfered from the FIB sample holder to another one fitting into the target SEM or (S)TEM.

With the FB-2200, this problem does not exist:
Hitachi offers compatible sample holders which can be inserted in both, the FIB and the SEM / (S)TEM unit. Once the specimen has been mounted on the compatible holder by Hitachi's patented in-situ microsampling system, besides a safe, quick transfer from the FIB to the analysis tool, this concept also allows an easy re-work of pre-prepared specimen if this should be required.
Holder compatibility exists between FB-2200 and

• S-4700, S-4800I
• S-4800II, SU6600, SU-70, SU8000

• S-5200 / S-5500
• HD-2300A, HD-2700,
• HF-3300

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Accelerating voltage	10 - 40 kV (2 and 5kV option)
Maximum beam current        (high current column option)	60nA at 40 kV
Maximum beam current density	50A/cm2 at 40 kV
SIM Image resolution	6 nm or better at 40 kV
Micro Sampling System for in-situ       TEM lamella extraction	Hitachi patent
Deposition systems	W, C dual system
Auto-fabrication Software	incl. milling position correction
Vector Scan Software
Eucentric Auto-Stage (2 types)       for larger specimen	allows sample holder     compatibility to SEM
Side Entry Stage (3 types)	allows sample holder     compatibility to TEM,     HD, S-5500

FB-2100 (PDF, 1.7MB)
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To contact to Hitachi about this or other electron microscopes,

• call       +49 (0)2151 64 35 300
• fax        +49 (0)2151 64 35 699
• email:   eminfo@hht-eu.com
• mail:     Hitachi High-Technologies Europe GmbH
               Nanotechnology Equipment Dept.
               Europark Fichtenhain A12
               47807 Krefeld
               Germany